News Article
Mentor Graphics` Calibre Division Has Reached An Agreement With IMEC To
Mentor Graphics' Calibre division has reached an agreement with IMEC to
cooperate on subwavelength lithography. IMEC will use Calibre's resolution
enhancement technology (RET) software on high-numerical aperture (NA) 193nm
and 157nm processes. The organisations have collaborated informally since
1999. The new three-year agreement makes Mentor Graphics a formal member of
IMEC's industrial affiliation programs (IIAPs) for the development of
high-NA 193nm and 157nm lithography.
One research area for the collaboration is the double-exposure dipole
decomposition resolution enhancement technique, which uses less expensive
binary masks. This technique aims at obtaining resolutions similar to more
expensive alternating, strong phase shift mask method.
decomposition resolution enhancement technique, which uses less expensive
binary masks. This technique aims at obtaining resolutions similar to more
expensive alternating, strong phase shift mask method.
